Metal‐Organic Frameworks as Catalyst Supports: Influence of Lattice Disorder on Metal Nanoparticle Formation
نویسندگان
چکیده
منابع مشابه
Formation of TiO2 Thin Films using NH3 as Catalyst by Metalorganic Chemical Vapor Deposition
We have studied metalorganic chemical vapor deposition of TiO2 thin films using titanium tetra-isopropoxide [TTIP, Ti(O–C3H7)4] and NH3 as a catalyst at deposition temperatures ranging from 250 to 365◦C. At deposition temperatures above 330◦C, pyrolytic self-decomposition of TTIP is dominant regardless of the use of NH3, and the activation energy for TiO2 film formation is 152 kJ/mol. At deposi...
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ژورنال
عنوان ژورنال: Chemistry – A European Journal
سال: 2018
ISSN: 0947-6539,1521-3765
DOI: 10.1002/chem.201800694